The temperature dependence of 1.3-and 1.5-μm compressively strained InGaAs(P) MQW semiconductor lasers

被引:158
作者
Phillips, AF
Sweeney, SJ
Adams, AR
Thijs, PJA
机构
[1] Univ Surrey, Sch Phys Sci, Dept Phys, Guildford GU2 5XH, Surrey, England
[2] Uniphase Netherlands BV, NL-5656 AA Eindhoven, Netherlands
基金
英国工程与自然科学研究理事会;
关键词
laser thermal factors; optical fiber communication; optical measurement; quantum-well lasers; semiconductor lasers; strain; temperature; temperature measurement;
D O I
10.1109/2944.788398
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have studied experimentally and theoretically the spontaneous emission from 1,3- and 1.5-mu m compressively strained InCaAs(P) multiple-quantum-well lasers in the temperature range 90-400 K to determine the variation of carrier density n with current I up to threshold. We find that the current contributing to spontaneous emission at threshold I-Rad is always well behaved and has a characteristic temperature T-0 (I-Rad) approximate to T, as predicted by simple theory. This implies that the carrier density at threshold is also proportional to temperature. Below a breakpoint temperature T-B, we find I proportional to n(Z), where Z = 2, and the total current at threshold I-th also has a characteristic temperature T-0(I-th) approximate to T, showing that the current is dominated by radiative transitions right up to threshold, Above T-B, Z increases steadily to Z approximate to 3 and T-0 (I-th) decreases to a value less than T/3. This behavior is explained in terms of the onset of Auger recombination above T-B. a conclusion supported by measurements of the pressure dependence of I-th From our results, we estimate that, at 300 K, Auger recombination accounts for 50% of I-th in the 1.3-mu m laser and 80% of I-th, in the 1.5-mu m laser, Measurements of the spontaneous emission and differential efficiency indicate that a combination of increased optical losses and carrier overflow into the barrier and separate confinement heterostructure regions may further degrade T-0 (I-th) above room temperature.
引用
收藏
页码:401 / 412
页数:12
相关论文
共 55 条
[1]   ANALYSIS OF GAIN IN DETERMINING T-0 IN 1.3 MU-M SEMICONDUCTOR-LASERS [J].
ACKERMAN, DA ;
SHTENGEL, GE ;
HYBERTSEN, MS ;
MORTON, PA ;
KAZARINOV, RF ;
TANBUNEK, T ;
LOGAN, RA .
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1995, 1 (02) :250-263
[2]   A REASSESSMENT OF INTERVALENCE BAND ABSORPTION IN 1.6-MU-M (GALN)(ASP)/INP [J].
ADAMS, AR ;
HEASMAN, KC ;
HILTON, J .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1987, 2 (12) :761-764
[3]   THE TEMPERATURE-DEPENDENCE OF THE EFFICIENCY AND THRESHOLD CURRENT OF IN1-XGAXASYP1-Y LASERS RELATED TO INTERVALENCE BAND ABSORPTION [J].
ADAMS, AR ;
ASADA, M ;
SUEMATSU, Y ;
ARAI, S .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) :L621-L624
[4]   Semiconductor optoelectronic devices [J].
Adams, AR ;
Silver, M ;
Allam, J .
HIGH PRESSURE IN SEMICONDUCTOR PHYSICS II, 1998, 55 :301-352
[5]  
ADAMS AR, 1991, PROPERTIES INDIUM PH, V6, P100
[6]   LOW-THRESHOLD LAMBDA=1.3 MU-M MULTIQUANTUM-WELL LASER-DIODES GROWN BY METALORGANIC VAPOR-PHASE EPITAXY USING TERTIARYBUTYLARSINE AND TERTIARYBUTYLPHOSPHINE PRECURSORS [J].
AE, S ;
TERAKADO, T ;
NAKAMURA, T ;
TORIKAI, T ;
UJI, T .
JOURNAL OF CRYSTAL GROWTH, 1994, 145 (1-4) :852-857
[7]  
Agrawal G. P., 1986, LONG WAVELENGTH SEMI, P113
[8]   EFFECT OF THERMIONIC ELECTRON-EMISSION FROM THE ACTIVE LAYER ON THE INTERNAL QUANTUM EFFICIENCY OF INGAASP LASERS OPERATING AT 1.3 MU-M [J].
ANDREKSON, PA ;
KAZARINOV, RF ;
OLSSON, NA ;
TANBUNEK, T ;
LOGAN, RA .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1994, 30 (02) :219-221
[9]   NOVEL TECHNIQUE FOR DETERMINING INTERNAL LOSS OF INDIVIDUAL SEMICONDUCTOR-LASERS [J].
ANDREKSON, PA ;
OLSSON, NA ;
TANBUNEK, T ;
LOGAN, RA ;
COBLENTZ, D ;
TEMKIN, H .
ELECTRONICS LETTERS, 1992, 28 (02) :171-172
[10]   DIRECT MEASUREMENT OF THE CARRIER LEAKAGE OUT OF THE ACTIVE-REGION IN INGAASP/INP LASER HETEROSTRUCTURES [J].
BELENKY, GL ;
KAZARINOV, RF ;
LOPATA, J ;
LURYI, S ;
TANBUNELK, T ;
GARBINSKI, PA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1995, 42 (02) :215-218