Influence of B- and N-doping levels on the quality and morphology of CVD diamond

被引:21
作者
Eccles, AJ
Steele, TA
Afzal, A
Rego, CA
Ahmed, W
May, PW
Leeds, SM
机构
[1] Manchester Metropolitan Univ, Dept Chem & Mat, Manchester M1 5GD, Lancs, England
[2] Millbrook Instruments Ltd, Blackburn Technol Ctr, Blackburn BB1 5QB, Lancs, England
[3] Univ Bristol, Sch Chem, Bristol BS8 1TS, Avon, England
关键词
chemical vapour deposition; diamond; secondary ion mass spectrometry;
D O I
10.1016/S0040-6090(98)01667-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Diamond films have been grown by hot filament and microwave plasma assisted CVD using precursor gas mixtures of 1% methane in hydrogen with additional nitrogen and boron dopants. Structural and compositional characterisation of the as-grown films was carried out by scanning electron microscopy and secondary ion mass spectrometry. SIMS measurements show the B-doping efficiency is close to unity, whereas that of nitrogen is less than 10(-3). In conjunction with modelling of the gas-phase CVD environment we show that variations in the film morphology and quality can be accounted for by changes in the concentrations of the gas-phase precursor species rather than incorporation of the dopant into the diamond lattice. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:627 / 631
页数:5
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