Chemical vapor deposition enhanced by atmospheric pressure non-thermal non-equilibrium plasmas

被引:85
作者
Alexandrov, SE
Hitchman, ML
机构
[1] Univ Strathclyde, Dept Pure & Appl Chem, Glasgow G1 1XL, Lanark, Scotland
[2] St Petersburg State Polytech Univ, Dept Elect Mat Technol, St Petersburg 195251, Russia
关键词
non-thermal plasmas; non-equilibrium plasmas; AP-PECVD principles and applications;
D O I
10.1002/cvde.200500026
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Ibis review gives an overview of the characteristics of various non-thermal, non-equilibrium plasmas and discusses applications of AP-PECVD with dielectric barrier discharges, corona discharges, RF discharges, and microwave discharges.
引用
收藏
页码:457 / 468
页数:12
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