Chemical vapor deposition enhanced by atmospheric pressure non-thermal non-equilibrium plasmas

被引：85

作者：

Alexandrov, SE

Hitchman, ML

机构：

[1] Univ Strathclyde, Dept Pure & Appl Chem, Glasgow G1 1XL, Lanark, Scotland

[2] St Petersburg State Polytech Univ, Dept Elect Mat Technol, St Petersburg 195251, Russia

来源：

CHEMICAL VAPOR DEPOSITION | 2005年 / 11卷 / 11-12期

关键词：

non-thermal plasmas; non-equilibrium plasmas; AP-PECVD principles and applications;

D O I：

10.1002/cvde.200500026

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Ibis review gives an overview of the characteristics of various non-thermal, non-equilibrium plasmas and discusses applications of AP-PECVD with dielectric barrier discharges, corona discharges, RF discharges, and microwave discharges.

引用

页码：457 / 468

页数：12

共 63 条

[41] Zirconia coating on amorphous magnetic powder by atmospheric pressure glow plasma [J].

Ogawa, S ;

Takeda, A ;

Oguchi, M ;

Tanaka, K ;

Inomata, T ;

Kogoma, M .

THIN SOLID FILMS, 2001, 386 (02) :213-216

[42] APPEARANCE OF STABLE GLOW-DISCHARGE IN AIR, ARGON, OXYGEN AND NITROGEN AT ATMOSPHERIC-PRESSURE USING A 50-HZ SOURCE [J].

OKAZAKI, S ;

KOGOMA, M ;

UEHARA, M ;

KIMURA, Y .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1993, 26 (05) :889-892

[43]

OPALISKA T, 2002, P INT S HIGH PRESS L, V8, P420

[44] Physical and chemical properties of hybrid barrier coatings obtained in an atmospheric pressure dielectric barrier discharge [J].

Paulussen, S ;

Rego, R ;

Goossens, O ;

Vangeneugden, D ;

Rose, K .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2005, 38 (04) :568-575

[45] Deposition of SiOx thin films by microwave induced plasma CVD at atmospheric pressure [J].

Pfuch, A ;

Cihar, R .

SURFACE & COATINGS TECHNOLOGY, 2004, 183 (2-3) :134-140

[46] Polymer deposition using atmospheric pressure plasma glow (APG) discharge [J].

Prat, R ;

Koh, YJ ;

Babukutty, Y ;

Kogoma, M ;

Okazaki, S ;

Kodama, M .

POLYMER, 2000, 41 (20) :7355-7360

[47] PULSED BARRIER DISCHARGES FOR THIN-FILM PRODUCTION AT ATMOSPHERIC-PRESSURE [J].

REITZ, U ;

SALGE, JGH ;

SCHWARZ, R .

SURFACE & COATINGS TECHNOLOGY, 1993, 59 (1-3) :144-147

[48]

Roth J. R., 2001, IND PLASMA ENG, V2

[49] The physics and phenomenology of one atmosphere uniform glow discharge plasma (OAUGDP™) reactors for surface treatment applications [J].

Roth, JR ;

Rahel, J ;

Dai, X ;

Sherman, DM .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2005, 38 (04) :555-567

[50] The effects of deposition and test conditions on nanomechanical behaviour of ultrathin films produced by plasma-enhanced chemical vapour deposition process at atmospheric pressure [J].

Rymuza, Z ;

Misiak, M ;

Rzanek-Boroch, Z ;

Schmidt-Szalowski, K ;

Janowska, J .

THIN SOLID FILMS, 2004, 466 (1-2) :158-166

← 1 2 3 4 5 6 7 →