Mass spectrometric detection of reactive neutral species: Beam-to-background ratio

被引:76
作者
Singh, H [1 ]
Coburn, JW [1 ]
Graves, DB [1 ]
机构
[1] Univ Calif Berkeley, Dept Chem Engn, Berkeley, CA 94720 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1999年 / 17卷 / 05期
关键词
D O I
10.1116/1.581981
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Mass spectrometry and appearance potential mass spectrometry (APMS) have recently gained importance for detection and quantitative measurements of reactive radical species in plasmas using line-of-sight sampling of reactive species. In this work, we have characterized the contributions to the mass spectrometer signal from the line-of-sight "beam" component and the background component of the species in the ionizer of the mass spectrometer. The beam signal is proportional to the number density of the species in the plasma, while the background component of the signal depends on Various factors like the vacuum system design and pump speeds. Single differential pumping of the mass spectrometer is found to be inadequate as the background signal dominates the beam signal for radical and stable neutral species. The beam to background ratio for CFx (x = 1-3) radicals is smaller than 0.25 and the large background signals of the species of interest necessitates implementation of modulated beam mass spectrometry using a mechanical chopper in the beam path. The uncertainty in the beam component measurement is found to be as large as +/- 180%. High beam-to-background signal ratio is achieved using three stages of differential pumping, and this vastly reduces the uncertainty in the beam component measurement to less than +/- 10%. (C) 1999 American Vacuum Society. [S0734-2101(99)10505-0].
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页码:2447 / 2455
页数:9
相关论文
共 17 条
[11]  
MULLER N, 1990, J VAC SCI TECHNOL A, V8, P3822
[12]   APPEARANCE MASS-SPECTROMETRY OF NEUTRAL RADICALS IN RADIO-FREQUENCY PLASMAS [J].
SUGAI, H ;
TOYODA, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04) :1193-1200
[13]   ABSOLUTE PARTIAL CROSS-SECTIONS FOR THE PARENT IONIZATION OF THE CFX (X=1-3) FREE-RADICALS BY ELECTRON-IMPACT [J].
TARNOVSKY, V ;
BECKER, K .
JOURNAL OF CHEMICAL PHYSICS, 1993, 98 (10) :7868-7874
[14]   Kinetics of F atoms and fluorocarbon radicals studied by threshold ionization mass spectrometry in a microwave CF4 plasma [J].
Tserepi, A ;
Schwarzenbach, W ;
Derouard, J ;
Sadeghi, N .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1997, 15 (06) :3120-3126
[15]  
VASILE MJ, 1989, PLASMA DIAGNOSTICS, V1, P210
[16]   THE THRESHOLD LAW FOR SINGLE IONIZATION OF ATOMS OR IONS BY ELECTRONS [J].
WANNIER, GH .
PHYSICAL REVIEW, 1953, 90 (05) :817-825
[17]  
WINTERS HF, 1992, SURF SCI REP, V14, P161, DOI 10.1016/0167-5729(92)90009-Z