Improved UV emission of zinc oxide through hyrogen doping in pulse-modulated high-power ICP

被引：8

作者：

Ishigaki, T

Ohashi, N

Taguchi, H

Ye, RB

Haneda, H

Ito, S

机构：

[1] Natl Inst Mat Sci, Adv Mat Lab, Tsukuba, Ibaraki 3050044, Japan

[2] Tokyo Univ Sci, Dept Pure & Appl Chem, Noda, Chiba 2788510, Japan

来源：

THIN SOLID FILMS | 2006年 / 506卷

关键词：

induction thermal plasma; pulse modulation; zinc oxide; UV emission; hydrogen doping;

D O I：

10.1016/j.tsf.2005.08.270

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Pulse-modulated high-power inductively coupled plasma (PM-ICP) as a radical source of high flux density was utilized to improve the UV emission efficiency of ZnO. The irradiation of argon-hydrogen PM-ICP plasma gave the improvement of the UV emission at 380 nm. The relationship between the treatment condition and the emission properties was examined with respect to hydrogen dissolution. When treated in the tail plasma flame with adequate cooling, the specimen showed the intense UV emission. The control of heat flux by mixing nitrogen gas to the hydrogen-containing plasma also had a favorable influence on the UV emission. (c) 2005 Elsevier B.V. All rights reserved.

引用

收藏

页码：303 / 306

页数：4

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