Aberrations and allowances for errors in a hemisphere solid immersion lens for submicron-resolution photoluminescence microscopy

被引：53

作者：

Baba, M ^{[1
]}

Sasaki, T ^{[1
]}

Yoshita, M ^{[1
]}

Akiyama, H ^{[1
]}

机构：

[1] Univ Tokyo, Inst Solid State Phys, Minato Ku, Tokyo 1068666, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 1999年 / 85卷 / 09期

关键词：

D O I：

10.1063/1.370107

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have analyzed the aberrations and allowances for an aspheric error, a thickness error, and an air gap in a hemisphere solid immersion lens for photoluminescence microscopy with submicron resolution beyond the diffraction limit, where light with large ray angle and the effect of an evanescent field play important roles. (C) 1999 American Institute of Physics. [S0021-8979(99)06209-X].

引用

页码：6923 / 6925

页数：3

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