Metal-organic chemical vapor deposition of CeO2 ⟨100⟩ oriented films on no-rolled Hastelloy C276

被引:35
作者
Lo Nigro, R [1 ]
Malandrino, G [1 ]
Fragalà, IL [1 ]
机构
[1] Univ Catania, Dipartimento Sci Chim, I-95125 Catania, Italy
关键词
D O I
10.1021/cm011232f
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
MOCVD has been applied to the first successful deposition of CeO2 (100) oriented films on no-rolled Hastelloy C276. The presently found columnar grain morphologies have been related to the zone model proposed by Mochvan and Demchishin for physical vapor deposition processes. The fiber texture strongly depends on the deposition temperature.
引用
收藏
页码:4402 / +
页数:4
相关论文
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