Segregation, interface morphology, and the optical properties of GaAs/AlAs quantum wells: A theoretical study

被引:15
作者
Koiller, B
Capaz, RB
Chacham, H
机构
[1] Univ Fed Rio de Janeiro, Inst Fis, BR-21945970 Rio De Janeiro, Brazil
[2] Univ Fed Minas Gerais, Dept Fis, ICEx, BR-30123970 Belo Horizonte, MG, Brazil
来源
PHYSICAL REVIEW B | 1999年 / 60卷 / 03期
关键词
D O I
10.1103/PhysRevB.60.1787
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate optical signatures of interface segregation phenomena in epitaxially grown narrow quantum wells. Short-period step formation and segregation during growth are simulated via a generalized kinetic-limited segregation model that allows for combined vertical and lateral atomic exchanges with respect to the surface. Segregation always leads to more abrupt inverted (GaAs-on-AlAs) interfaces as compared to normal (AlAs-on-GaAs) interfaces, where a wider alloy region is present. The electronic structure of quantum wells is determined in the tight-binding approach applied to supercells (similar to 10(4) atoms) with periodic boundary conditions. The atomic configurations are numerically generated according to the two-dimensional composition profiles obtained from the generalized kinetic-limited segregation model. Disorder is incorporated through an ensemble of such generated configurations, over which averaged electronic quantities are obtained. The correlation between the interface degree of roughness, alloying, and its optical properties is demonstrated. We show that segregation may improve the light-emission properties of quantum wells by reducing the roughness of stepped interfaces. [S0163-1829(99)05727-6].
引用
收藏
页码:1787 / 1791
页数:5
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