Dielectric function of wurtizite GaN and AlN thin films
被引:73
作者:
Benedict, LX
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机构:
Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USALawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
Benedict, LX
[1
]
Wethkamp, T
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机构:Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
Wethkamp, T
Wilmers, K
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机构:Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
Wilmers, K
Cobet, C
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机构:Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
Cobet, C
Esser, N
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机构:Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
Esser, N
Shirley, EL
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机构:Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
Shirley, EL
Richter, W
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机构:Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
Richter, W
Cardona, M
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机构:Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
Cardona, M
机构:
[1] Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
semiconductors;
electronic band structure;
optical properties;
synchrotron radiation;
D O I:
10.1016/S0038-1098(99)00323-3
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
Measurements and calculations of the dielectric function of wurtzite GaN and AIN are presented. Spectroscopic ellipsometry was used to determine epsilon(omega) Of thin film samples in the energy range from 3 to 9.8 eV. Calculations of epsilon(omega) for the bulk materials were performed within a first-principles electronic structure scheme that includes the electron-hole interaction. The agreement between experiment and theory is dramatically improved over the previous work, a result of improvements in both experimental technique and theoretical description. The predicted polarization dependence of the dielectric function of these materials exhibits features similar to that in other wurtzite structure materials. (C) 1999 Published by Elsevier Science Ltd. All rights reserved.