High-power operation of III-N MOSHFET RF switches

被引:15
作者
Yang, Z [1 ]
Koudymov, A [1 ]
Adivarahan, V [1 ]
Yang, J [1 ]
Simin, G [1 ]
Khan, MA [1 ]
机构
[1] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
关键词
field-effect transistor (FET); GaN; heterostructure field-effect transistor (HFET); high electron mobility transistor (HEMT); metal-oxide semiconductor heterostructure field-effect transistor (MOSHFET); radio frequency (RF); switch; wireless;
D O I
10.1109/LMWC.2005.860011
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We describe a large-signal performance of novel highpower radio frequency (RF) switches based on III-nitride insulated gate metal-oxide semiconductor heterostructure field-effect transistors (MOSHFETs). The maximum switching powers for a single MOSHFET with only 1-mm gate width exceed 50 W at 10 GHz, more than an order of magnitude higher than those achievable using GaAs transistors. In the ON state, the highest powers are determined by the device peak drain currents, 1-2 A/mm for the state-of-the art III-N MOSHFETs; in the OFF state their maximum powers are limited by the breakdown voltage, normally well above 100 V. Our experimental data are in close agreement with large-signal simulations and the proposed simple analytical model. We also show that the insulating gate design allows for broader hand-width and higher switching powers and better stability as compared to conventional Schottky gate transistors.
引用
收藏
页码:850 / 852
页数:3
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