Nanoporous, ultralow-dielectric-constant fluoropolymer films from agglomerated and crosslinked hollow nanospheres of poly(pentafluorostyrene)-block-poly(divinylbenzene)

被引：52

作者：

Fu, GD ^{[1
]}

Shang, ZH ^{[1
]}

Hong, L ^{[1
]}

Kang, ET ^{[1
]}

Neoh, KG ^{[1
]}

机构：

[1] Natl Univ Singapore, Dept Chem & Biomol Engn, Singapore 119260, Singapore

来源：

ADVANCED MATERIALS | 2005年 / 17卷 / 21期

关键词：

D O I：

10.1002/adma.200500762

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Nanoporous fluoropolymer films with dielectric constants below 2 are prepared via consecutive surface-initiated atom transfer radical polymerization of pentafluorstyrene (PFS) and divinylbenzene (DVB) on silica nanospheres. After agglomeration of the nanospheres, crosslinking of the nanospheres by UV, and removal of the silica cores (see figure), a nanoporous fluoropolymer film with a dielectric constant as low as 1.7 is formed.

引用

页码：2622 / +

页数：6

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