Photochemistry and patterning of monolayer films from 11-phenylundecyltrichlorosilane

被引：18

作者：

Friedli, AC ^{[1
]}

Roberts, RD

Dulcey, CS

Hsu, AR

McElvany, SW

Calvert, JM

机构：

[1] Middle Tennessee State Univ, Dept Chem, Murfreesboro, TN 37132 USA

[2] Geocenters Inc, Ft Washington, MD 20744 USA

[3] USN, Res Lab, Ctr Biomol Sci & Engn, Washington, DC 20375 USA

[4] USN, Res Lab, Div Chem, Washington, DC 20375 USA

来源：

LANGMUIR | 2004年 / 20卷 / 10期

关键词：

D O I：

10.1021/la030353m

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The photochemistry and patterning of Monolayer Films from 11-Phenylundecyltrichlorosilane were examined. Self-assembled monolayer (SAM) films were photopatterned at high resolution using UV lamp and laser exposure sources. Patterned photochemical transformation to carbonyl films was used for selective metal deposition on Si wafers. The pyridyl ligand was complexed with a catalyst and metal deposited in an electroless process to give metal lines. Laser desorption Fourier transform mass spectrometry was used to study the photochemically desorbed photoproducts from films.

引用

页码：4295 / 4298

页数：4

共 28 条

[1] Ion beam modification and patterning of organosilane self-assembled monolayers [J].

Ada, ET ;

Hanley, L ;

Etchin, S ;

Melngailis, J ;

Dressick, WJ ;

Chen, MS ;

Calvert, JM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :2189-2196

[2] Fabrication of patterned amine reactivity templates using 4-chloromethylphenylsiloxane self-assembled monolayer films [J].

Brandow, SL ;

Chen, MS ;

Aggarwal, R ;

Dulcey, CS ;

Calvert, JM ;

Dressick, WJ .

LANGMUIR, 1999, 15 (16) :5429-5432

[3] SILANIZATION OF SOLID SUBSTRATES - A STEP TOWARD REPRODUCIBILITY [J].

BRZOSKA, JB ;

BENAZOUZ, I ;

RONDELEZ, F .

LANGMUIR, 1994, 10 (11) :4367-4373

[4]

CALVERT JM, 1995, THIN FILMS ORGANIC T, V20, P109

[5] Photocontrolled formation of hydroxyl-bearing monolayers and multilayers [J].

Collins, RJ ;

Bae, IT ;

Scherson, DA ;

Sukenik, CN .

LANGMUIR, 1996, 12 (23) :5509-5511

[6] Why is coordination chemistry stretching the limits of micro-electronics technology? [J].

Doppelt, P .

COORDINATION CHEMISTRY REVIEWS, 1998, 178 :1785-1809

[7] Patterned noncovalent binding and metallization of adsorbates in thin film nanocavities [J].

Dressick, WJ ;

Chen, MS ;

Brandow, SL .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2000, 122 (05) :982-983

[8] PHOTOPATTERNING AND SELECTIVE ELECTROLESS METALLIZATION OF SURFACE-ATTACHED LIGANDS [J].

DRESSICK, WJ ;

DULCEY, CS ;

GEORGER, JH ;

CALVERT, JM .

CHEMISTRY OF MATERIALS, 1993, 5 (02) :148-150

[9] Imaging layers for 50 kV electron beam lithography: Selective displacement of noncovalently bound amine ligands from a siloxane host film [J].

Dressick, WJ ;

Chen, MS ;

Brandow, SL ;

Rhee, KW ;

Shirey, LM ;

Perkins, FK .

APPLIED PHYSICS LETTERS, 2001, 78 (05) :676-678

[10] Photochemistry and patterning of self-assembled monolayer films containing aromatic hydrocarbon functional groups [J].

Dulcey, CS ;

Georger, JH ;

Chen, MS ;

McElvany, SW ;

OFerrall, CE ;

Benezra, VI ;

Calvert, JM .

LANGMUIR, 1996, 12 (06) :1638-1650

← 1 2 3 →