Non-equilibrium deposition of phase pure Cu2O thin films at reduced growth temperature

被引:57
作者
Subramaniyan, Archana [1 ,2 ]
Perkins, John D. [1 ]
O'Hayre, Ryan P. [2 ]
Lany, Stephan [1 ]
Stevanovic, Vladan [1 ]
Ginley, David S. [1 ]
Zakutayev, Andriy [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
[2] Colorado Sch Mines, Dept Met & Mat Engn, Golden, CO 80401 USA
来源
APL MATERIALS | 2014年 / 2卷 / 02期
关键词
PULSED-LASER DEPOSITION; COPPER-OXIDE FILMS; CUPROUS-OXIDE; SOLAR-CELLS; SUBSTRATE; PHOTOVOLTAICS; EPITAXY;
D O I
10.1063/1.4865457
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Cuprous oxide (Cu2O) is actively studied as a prototypical material for energy conversion and electronic applications. Here we reduce the growth temperature of phase pure Cu2O thin films to 300 degrees C by intentionally controlling solely the kinetic parameter (total chamber pressure, P-tot) at fixed thermodynamic condition (0.25 mTorr pO(2)). A strong non-monotonic effect of P-tot on Cu-O phase formation is found using high-throughput combinatorial-pulsed laser deposition. This discovery creates new opportunities for the growth of Cu2O devices with low thermal budget and illustrates the importance of kinetic effects for the synthesis of metastable materials with useful properties. (C) 2014 Author(s).
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页数:6
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