The Origin of the Magnetism of Etched Silicon

被引：44

作者：

Grace, Patrick J. ^{[1
]}

Venkatesan, Munuswamy ^{[1
]}

Alaria, Jonathan ^{[1
]}

Coey, J. Michael D. ^{[1
]}

Kopnov, Gregory ^{[2
]}

Naaman, Ron ^{[2
]}

机构：

[1] Trinity Coll Dublin, CRANN & Sch Phys, Dublin 2, Ireland

[2] Weizmann Inst Sci, Dept Chem Phys, IL-76100 Rehovot, Israel

来源：

ADVANCED MATERIALS | 2009年 / 21卷 / 01期

关键词：

D O I：

10.1002/adma.200801098

中图分类号：

O6 [化学];

学科分类号：

070301 [无机化学];

摘要：

A recent report of ferromagnetism appearing in silicon after etching in hot KOH (Kopnov et al., Adv. Mater. 2007, 79, 925) is shown to be due to iron from the pyrex glassware, which precipitates on the silicon surface in the form of well-separated ferromagnetic nanoparticles. The reaction is explained in terms of the Pourbaix diagram.

引用

页码：71 / 74

页数：4

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