Nanostructured multilayer graded-index antireflection coating for Si solar cells with broadband and omnidirectional characteristics

被引：270

作者：

Chhajed, Sameer ^{[1
]}

Schubert, Martin F. ^{[1
]}

Kim, Jong Kyu ^{[1
]}

Schubert, E. Fred ^{[1
,2
]}

机构：

[1] Rensselaer Polytech Inst, Future Chips Constellat, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA

[2] Rensselaer Polytech Inst, Future Chips Constellat, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA

来源：

APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 25期

基金：

美国国家科学基金会;

关键词：

antireflection coatings; elemental semiconductors; nanostructured materials; nanotechnology; optical multilayers; refractive index; silicon; silicon compounds; solar cells;

D O I：

10.1063/1.3050463

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Design, fabrication, and characterization of a broadband, omnidirectional, graded-index antireflection (AR) coating made using nanostructured low-refractive-index (n=1.05-1.40) silica deposited by oblique-angle deposition are reported. Averaged over wavelength range from 400 to 1100 nm and 0 degrees-90 degrees angle of incidence, polished Si reflects similar to 37% of incident radiation. The reflection losses are reduced to only 5.9% by applying a three-layer graded-index AR coating to Si. Our experimental results are in excellent agreement with theoretical calculations. The AR coatings reported here can be optimized for photovoltaic cells made of any type of material.

引用

页数：3

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