Submicron x-ray diffraction and its applications to problems in materials and environmental science

被引:153
作者
Tamura, N
Celestre, RS
MacDowell, AA
Padmore, HA
Spolenak, R
Valek, BC
Chang, NM
Manceau, A
Patel, JR
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, ALS, Berkeley, CA 94720 USA
[2] Agere Syst, Murray Hill, NJ 07974 USA
[3] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
[4] Univ Grenoble 1, LGIT, Environm Geochem Grp, F-38041 Grenoble 9, France
[5] Stanford Univ, Stanford Linear Accelerator Ctr, SSRL, Stanford, CA 94309 USA
关键词
D O I
10.1063/1.1436539
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The availability of high brilliance third generation synchrotron sources together with progress in achromatic focusing optics allows us to add submicron spatial resolution to the conventional century-old x-ray diffraction technique. The new capabilities include the possibility to map in situ, grain orientations, crystalline phase distribution, and full strain/stress tensors at a very local level, by combining white and monochromatic x-ray microbeam diffraction. This is particularly relevant for high technology industry where the understanding of material properties at a microstructural level becomes increasingly important. After describing the latest advances in the submicron x-ray diffraction techniques at the Advanced Light Source, we will give some examples of its application in material science for the measurement of strain/stress in metallic thin films and interconnects. Its use in the field of environmental science will also be discussed. (C) 2002 American Institute of Physics.
引用
收藏
页码:1369 / 1372
页数:4
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