New method of tubular material inner surface modification by plasma source ion implantation

被引:37
作者
Sun, M
Yang, SZ
Li, B
机构
[1] Group 101, Institute of Physics, Chinese Academy of Sciences
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 02期
关键词
D O I
10.1116/1.579902
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Plasma source ion implantation is a non-line-of-sight ion implantation technique for surface modification of materials, but that technique is only suitable for outer surface modification of hollow targets, not for inner surface modification. In this article we present a new method that applies to inner surface implantation. Preliminary experimental results show that this new method increases plasma density and uniformity inside the tubular tar-get with the inner surface, generates a plasma sheath between the inner surface of the target and the plasma to implant the inner surface of the target effectively, and achieves a dose uniformity that is acceptable for industrial applications. (C) 1996 American Vacuum Society.
引用
收藏
页码:367 / 369
页数:3
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