Microfabrication of high-temperature silicon devices using wafer bonding and deep reactive ion etching

被引:59
作者
Mehra, A
Ayón, AA
Waitz, IA
Schmidt, MA
机构
[1] MIT, Dept Aeronaut & Astronaut, Gas Turbine Lab, Cambridge, MA 02139 USA
[2] MIT, Dept Elect Engn & Comp Sci, Microsyst Technol Labs, Cambridge, MA 02139 USA
关键词
aligned fusion bonding; combustor efficiency; deep reactive ion etching; fuel injector; fuel manifold; gas turbine engine; hydrogen-air combustion; microcombustor; micro heat engine; silicon creep; silicon oxidation; turbine inlet temperature;
D O I
10.1109/84.767111
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As part of an effort to develop a micro gas turbine engine capable of providing 10-50 W of electrical power in a package less than one cubic centimeter in volume, we report the fabrication and testing of the first hydrogen combustor micromachined from silicon. Measuring 0.066 cm(3) in volume, and complete with a fuel manifold and set of fuel injector holes, the fabrication of the device was largely enabled by the use of deep reactive ion etching (DRIE) and aligned silicon wafer bonding. The 150-W microcombustor has a power density in excess of 2000 MW/m(3) and has been successfully demonstrated to provide turbine inlet temperatures up to 1800 K. After 15 h of experimental tests, the combustor maintained its mechanical integrity and did not exhibit any visible damage. Combined with the results of a materials oxidation study, these tests are used to demonstrate the satisfactory performance of silicon in the harsh oxidizing environment of a combustion chamber.
引用
收藏
页码:152 / 160
页数:9
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