Reactive ion etching of waveguide structures in diamond

被引：35

作者：

Hiscocks, Mark P. ^{[1
]}

Kaalund, Christopher J. ^{[1
]}

Ladouceur, Francois ^{[1
]}

Huntington, Shane T. ^{[2
]}

Gibson, Brant C. ^{[2
]}

Trpkovski, Steven ^{[2
]}

Simpson, David ^{[2
]}

Ampem-Lassen, Eric ^{[2
]}

Prawer, Steven ^{[2
]}

Butlerc, James E. ^{[3
]}

机构：

[1] Univ New S Wales, Sch Elect Engn & Telecommun, Sydney, NSW 2052, Australia

[2] Univ Melbourne, Sch Phys, Melbourne, Vic 3010, Australia

[3] USN, Res Lab, Washington, DC 20375 USA

来源：

关键词：

Diamond crystal; Diamond film; Reactive ion etching (RIE); Optical properties;

D O I：

10.1016/j.diamond.2008.04.019

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Waveguide structures were fabricated in both nanocrystalline CVD diamond (NCD) and HPHT type 1b single crystal diamond using photolithography and reactive ion etching. The combination of these techniques allows the patterning of many long photonic structures simultaneously, making it easily scalable. Emphasis has been placed on reducing sidewall roughness to prevent loss due to scattering. In single crystal diamond a peak-to-peak roughness of approximately 10 nm (estimated from SEM images) was achieved for the majority of the structure sidewall. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：1831 / 1834

页数：4

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