Nanowear/nanomechanical testing and the role of stress in sputtered CNx overcoats

被引:25
作者
Scharf, TW [1 ]
Deng, H [1 ]
Barnard, JA [1 ]
机构
[1] UNIV ALABAMA,CTR MAT INFORMAT TECHNOL,TUSCALOOSA,AL 35487
关键词
D O I
10.1063/1.365562
中图分类号
O59 [应用物理学];
学科分类号
摘要
a:C-N-x films were deposited on Si(111) wafers at ambient temperatures by reactive magnetron sputtering of C in a mixed Ar/N-2 discharge. The hardness (H) and elastic modulus (E) were assessed via nanoindentation using a Berkovich diamond indenter. The nitrogenated films exhibited increased hardness and elastic moduli values compared to the amorphous carbonated films, i.e., 25 and 240 GPa to 16 and 160 GPa, respectively. A sphere-on-flat (magnetic tape) wear tester was used to assess wear scar volume losses as a function of wear time. All films were in a state of compression (intrinsic and thermal stress). The bonding, composition, and structure of the films for all the deposition conditions were assessed by micro-Raman spectroscopy, energy dispersive x-ray spectroscopy (EDX), and x-ray diffraction (XRD), respectively, and subsequently correlated to overall film properties. (C) 1997 American Institute of Physics.
引用
收藏
页码:5393 / 5395
页数:3
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