Secondary electron emission measurements on synthetic diamond films

被引:21
作者
Hopman, HJ
Verhoeven, J
Bachmann, PK
Wilson, H
Kroon, R
机构
[1] FOM, Inst Atom & Mol Phys, NL-1098 SJ Amsterdam, Netherlands
[2] Philips Res Labs Aachen, D-52066 Aachen, Germany
[3] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
关键词
characterization; chemisorption; electron spectroscopy; synthetic diamond;
D O I
10.1016/S0925-9635(98)00451-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
During the electron irradiation of synthetic diamond films, three successive regimes are encountered as a function of the electron dose: (1) a reduction of the downward band bending of energy levels at the sample surface because an excess of secondary electrons leaves the sample; (2) the creation of an internal electric field in which secondary electrons drift to the surface, leading to an appreciable increase in the secondary emission and to a linear relation between the primary electron energy and the secondary electron yield; and (3) the desorption of hydrogen terminating the carbon surface bonds. The secondary emission thus decreases to very low values. The rate of decrease of secondary emission is similar for C:H- and C:H:Ba-terminated diamond surfaces. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:1033 / 1038
页数:6
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