Study on the crystallization behavior of amorphous carbon nitride films

被引：9

作者：

Xiao, XC ^{[1
]}

Jiang, WH ^{[1
]}

Song, LX ^{[1
]}

Tian, JF ^{[1
]}

Hu, XF ^{[1
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China

来源：

CHEMICAL PHYSICS LETTERS | 1999年 / 310卷 / 3-4期

关键词：

D O I：

10.1016/S0009-2614(99)00724-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Amorphous carbon nitride films were first prepared by DC reactive magnetron sputtering, followed by heat treatment under protective nitrogen. The ensuing thermal effects were analyzed by DTA-TG, XRD and XPS. The results showed that heat treatment above 1100 degrees C could induce the transition from an amorphous to a crystalline state of carbon nitride films. Apparent diffraction peaks of alpha-C3N4 appeared in the XRD spectra of samples heat-treated at 1180 degrees C. XPS results further supported the analysis of crystallization of the films after heat treatment. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：240 / 244

页数：5

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