Nanostructured surfaces for dramatic reduction of flow resistance in droplet-based microfluidics

被引:133
作者
Kim, JW [1 ]
Kim, CJ [1 ]
机构
[1] Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USA
来源
FIFTEENTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST | 2002年
关键词
D O I
10.1109/MEMSYS.2002.984306
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports a dramatic reduction of liquid droplet flow resistance by engineering the surfaces into nanomechanical hydrophobic structures that shows the contact angle over 175degrees. Flow resistances of droplets on open surfaces as well as in confined microchannels (between surfaces) have been measured with significant reduction of flow resistance (over 99% and over 95%, respectively) compared with a surface of the same material.
引用
收藏
页码:479 / 482
页数:4
相关论文
共 15 条
[1]   Pearl drops [J].
Bico, J ;
Marzolin, C ;
Quéré, D .
EUROPHYSICS LETTERS, 1999, 47 (02) :220-226
[2]   Wettability of porous surfaces. [J].
Cassie, ABD ;
Baxter, S .
TRANSACTIONS OF THE FARADAY SOCIETY, 1944, 40 :0546-0550
[3]   Ultrahydrophobic and ultralyophobic surfaces:: Some comments and examples [J].
Chen, W ;
Fadeev, AY ;
Hsieh, MC ;
Öner, D ;
Youngblood, J ;
McCarthy, TJ .
LANGMUIR, 1999, 15 (10) :3395-3399
[4]   STUDIES AT PHASE INTERFACES .1. SLIDING OF LIQUID DROPS ON SOLID SURFACES AND A THEORY FOR SPRAY RETENTION [J].
FURMIDGE, CG .
JOURNAL OF COLLOID SCIENCE, 1962, 17 (04) :309-&
[5]   Preparation of ultra water-repellent films by microwave plasma-enhanced CVD [J].
Hozumi, A ;
Takai, O .
THIN SOLID FILMS, 1997, 303 (1-2) :222-225
[6]   Ultra-hydrophobic fluorine polymer by Ar-ion bombardment [J].
Inoue, Y ;
Yoshimura, Y ;
Ikeda, Y ;
Kohno, A .
COLLOIDS AND SURFACES B-BIOINTERFACES, 2000, 19 (03) :257-261
[7]   THE BLACK SILICON METHOD - A UNIVERSAL METHOD FOR DETERMINING THE PARAMETER SETTING OF A FLUORINE-BASED REACTIVE ION ETCHER IN DEEP SILICON TRENCH ETCHING WITH PROFILE CONTROL [J].
JANSEN, H ;
DEBOER, M ;
LEGTENBERG, R ;
ELWENSPOEK, M .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1995, 5 (02) :115-120
[8]   The black silicon method .4. High aspect ratio trench etching for MEMS applications [J].
Jansen, H ;
deBoer, M ;
Elwenspoek, M .
NINTH ANNUAL INTERNATIONAL WORKSHOP ON MICRO ELECTRO MECHANICAL SYSTEMS, IEEE PROCEEDINGS: AN INVESTIGATION OF MICRO STRUCTURES, SENSORS, ACTUATORS, MACHINES AND SYSTEMS, 1996, :250-257
[9]   The property of plasma-polymerized fluorocarbon film in relation to CH4/C4F8 ratio and substrate temperature [J].
Matsumoto, Y ;
Ishida, M .
SENSORS AND ACTUATORS A-PHYSICAL, 2000, 83 (1-3) :179-185
[10]  
Miwa M, 2000, LANGMUIR, V16, P5754, DOI 10.1021/1a991660o