Preparation of ultra water-repellent films by microwave plasma-enhanced CVD

被引：231

作者：

Hozumi, A

Takai, O

机构：

[1] Dept. of Mat. Processing Engineering, Nagoya University, Nagoya 464-01, Chikusa-ku

来源：

THIN SOLID FILMS | 1997年 / 303卷 / 1-2期

基金：

日本学术振兴会;

关键词：

microwave plasma; chemical vapour deposition; ultra water repellency;

D O I：

10.1016/S0040-6090(97)00076-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ultra water-repellent films were prepared using tetramethylsilane (TMS) and fluoro-alkyl silane (FAS) by microwave plasma-enhanced CVD (PECVD). The contact angle for water drops increased with the total pressure of reactants. The maximum contact angle was about 160 degrees. Surface roughness increased with total pressure due to the growth of particles. Water repellency was dominated by not only the fluorine concentration at the surface but also the surface roughness. (C) 1997 Elsevier Science S.A.

引用

页码：222 / 225

页数：4

共 19 条

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GOTO T, 1991, CHEM EXPRESS, V6, P711

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