Electrodeposition of hard magnetic CoPtP material and integration into magnetic MEMS

被引:45
作者
Vieux-Rochaz, L
Dieppedale, C
Desloges, B
Gamet, D
Barragatti, C
Rostaing, H
Meunier-Carus, J
机构
[1] CEA, LETI, F-38054 Grenoble 9, France
[2] ENSIEG, LEG, F-38042 Grenoble, France
关键词
D O I
10.1088/0960-1317/16/2/005
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports on the electrodeposition at room temperature and the characterization of hard magnetic CoPtP material. An acidic bath has been set up to be compatible with the use of photoresist for micro technologies processes. X-ray diffraction (XRD) diagrams show that CoPtP alloy crystallizes in the hexagonal system. The film growth is generally columnar with a pronounced < 0 0 2 > texture associated with preferential out-of-plane magnetization. Using particular electrodeposition conditions, in-plane magnetization can be recovered and coercivities as high as 2800 Oe are reached for patterned layers. So a room temperature electroplating process able to produce patterned micromagnets usable in magnetic applications has been set up. Examples of the integration of CoPtP micromagnets are described through the fabrication of three devices: a multilayered giant magneto-resistive sensor biased by five electroplated magnets, a vertical magnetic bistable microactuator and a horizontal magnetic bistable microswitch. The main challenge for the last two devices was to demonstrate the actuation of a moving micromagnet without any mechanical guiding during commutation. The demonstrated bistability provided by the use of micromagnets emphasizes the interest in these devices for many applications.
引用
收藏
页码:219 / 224
页数:6
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