Optically variable micro-mirror arrays fabricated by graytone lithography

被引:13
作者
Leech, PW [1 ]
Lee, RA [1 ]
机构
[1] CSIRO, Mfg & Infrastruct Technol, Clayton, Vic 3169, Australia
关键词
micro-mirror arrays; graytone lithography; optically variable devices;
D O I
10.1016/j.mee.2005.10.002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The fabrication of micro-mirror based portrait and non-portrait images has been demonstrated by graytone lithography. The depiction of a portrait image was achieved by a novel modulation of the width of micro-apertures in the variable transparency mask. The non-portrait image was encoded as micro-mirrors of an opposing slope and orientation. An optical switch effect between the portrait and a non-portrait image was encoded into the mask by the arrangement of the micro-mirrors as a separate interleaved channel for each image. The lithographic exposure of the pattern into a layer of thick resist has produced an array of micro-mirrors with a depth of 10-30 pm. Various configurations of the micro-mirror arrays have been examined in relation to the type of micro-apertures and their orientation. Optically variable effects achieved in the micro-mirror devices have included a portrait to non-portrait switch, a positive to negative image switch and a non-portrait to non-portrait image switch. The micro-mirror structures have been hot embossed into polypropylene sheet using a Ni shim to create high quality optically variable images. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:351 / 356
页数:6
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