Colourtone lithography

被引：9

作者：

Lee, RA ^{[1
]}

机构：

[1] CSIRO, Clayton, Vic 3169, Australia

来源：

MICROELECTRONIC ENGINEERING | 2002年 / 61-2卷

关键词：

greytone lithography; microstructure fabrication;

D O I：

10.1016/S0167-9317(02)00520-8

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The greytone lithography technique is extended to include the concept of pixellated microstructure arrays defined by a palette of a finite number of 3D greytone pixel elements. Also discussed is a picture mapping process that enables the greytone pixels to be positioned at pre-defined locations within the pixellated microstructure array. Specific results relate to the application of the technique to the fabrication of micro-mirror arrays for anti-counterfeiting applications. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：105 / 111

页数：7

共 8 条

[1]

GIMKIEWICZ C, 1999, APPL OPTICS, V38, P4

[2] A new e-beam method for grey scale 3D optical elements. [J].

Kudryashov, VA ;

Prewett, PD ;

Michette, AG .

MICROELECTRONIC ENGINEERING, 1999, 46 (1-4) :209-212

[3] Micro-technology for anti-counterfeiting [J].

Lee, RA .

MICROELECTRONIC ENGINEERING, 2000, 53 (1-4) :513-516

[4]

LEE RA, 2001, Patent No. 4833

[5]

LEE RA, Patent No. 9900741

[6]

LEE RA, 1991, SPIE P, V1509, P48

[7]

Purdy D. R., 1994, Pure and Applied Optics, V3, P167, DOI 10.1088/0963-9659/3/2/009

[8]

REIMER K, 1997, P SOC PHOTO-OPT INS, V3226, P6

← 1 →