Optical properties of indium-doped ZnO films

被引:57
作者
Cao, YG [1 ]
Miao, L
Tanemura, S
Tanemura, M
Kuno, Y
Hayashi, Y
Mori, Y
机构
[1] Nagoya Inst Technol, Dept Environm Technol & Urban Planning, Showa Ku, Nagoya, Aichi 4668555, Japan
[2] NGK Insulators Ltd, Mat Res Lab, Nagoya, Aichi 4678530, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2006年 / 45卷 / 3A期
关键词
indium zinc oxide; optical transmittance; photoluminescence spectra; magnetron sputtering; thin film;
D O I
10.1143/JJAP.45.1623
中图分类号
O59 [应用物理学];
学科分类号
摘要
Indium-doped ZnO (IZO) films with low In content (< 6at.%) were fabricated by rf helicon inagnetron sputtering. The uniformity of the composites was confirmed by elemental analysis. The formation of an In-Zn-O solid Solution was verified using X-ray diffraction (XRD) patterns. A wide, high-transmittance re ion (400-2000 nm) and > 80% transmittance in the window of fiber optics telecommunication (1.30-1.55 mu m) were observed. The incorporation of indium enhances the optical transmission in the designated visible and infrared wavelengths. The optical band gap shows a slight blue-shift with increasing In doping which call be explained by the Burstein-Moss effect. The Urbach tail parameter E-0 increases with increasing indium content, which coincides with the increase in the full width half maximum (FWHM) of (0002) planes in XRD patterns. A decline in crystal quality with In incorporation in IZO films is also confirmed from photoluminescence (PL) spectra.
引用
收藏
页码:1623 / 1628
页数:6
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