Structural and optical properties of indium oxide thin films prepared by an ultrasonic spray CVD process

被引:164
作者
Girtan, M
Folcher, G
机构
[1] AII Cuza Univ, Solid State Dept, R-6600 Iasi, Romania
[2] Univ Paris 06, CNRS, Lab Phys Liquides & Electrochim, UPR 15, F-75252 Paris 05, France
关键词
indium oxide; chemical vapor deposition; X-ray diffraction; scanning electron microscopy; transmission;
D O I
10.1016/S0257-8972(03)00334-7
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Polycrystalline In2O3 thin films have been synthesized by a modified chemical vapor deposition process using the pyrolysis of an aerosol generated by ultrahigh frequency spraying of a volatile precursor solution. The deposition has been carried out on glass substrates (350-550 degreesC). X-Ray diffraction has shown that deposited films are polycrystalline without second phases. The morphology of the surface as function of the substrate temperature has been studied using scanning electron microscopy (LEO Stereoscan 440). Transmission and reflection spectra of the sprayed films were examined in the 260-2600 nm spectral range and, for investigated films, the transmission coefficient in the visible and infrared regions exceed 85% and is weakly affected by deposition temperature. The optical band gap values, E-g ranged between 3.57 and 3.68 eV. The Urbach tail parameter E-0, was calculated for films deposited at different temperatures. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:242 / 250
页数:9
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