APPLICATION OF PYROSOL DEPOSITION PROCESS FOR LARGE-AREA DEPOSITION OF FLUORINE-DOPED TIN DIOXIDE THIN-FILMS

We report on a pyrosol deposition process used for depositing on large-area (up to 100 cm long and 30 cm wide) soda-lime glass substrates of varying thicknesses (between 0.3 and 6 mm). Fluorine-doped tin oxide (SnO2:F) films were deposited on glass coated with a diffusion barrier of Al2O3. The film deposition was homogeneous and film properties were similar to those reported for films deposited by chemical vapour deposition. A minimum resistivity of 5 x 10(-4) Omega cm, carrier mobility of 20 cm(2) V(-1)s(-1) and optical transmission >80% for typical SnO2:F films 3000 Angstrom thick were achieved. Micrographs obtained by scanning electron microscopy of some typical films presented here demonstrate fairly good crystalline structure.