Ion-induced alkali-silicon interfaces: Atomistic simulations of collisional effects

被引:44
作者
Eckstein, W
Hou, M
Shulga, VI
机构
[1] FREE UNIV BRUSSELS,B-1050 BRUSSELS,BELGIUM
[2] MOSCOW MV LOMONOSOV STATE UNIV,INST NUCL PHYS,MOSCOW 119899,RUSSIA
关键词
D O I
10.1016/S0168-583X(96)00635-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The bombardment of Si with Cs is investigated by computer simulation with the program TRIDYN, The dynamic target changes due to the bombardment as composition profiles and the corresponding changes in sputtering yield and reaction coefficient are studied as functions of incident conditions, The incident energy is varied from 0.1 to 100 keV, and for 4 and 40 keV the dependence on the incident angle is considered. The dynamic results are compared with data from static calculations (low fluence),The influence of interaction potentials and of the choice of three surface binding energy models on the results are discussed.
引用
收藏
页码:477 / 486
页数:10
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