共 17 条
[11]
Contact etch scaling with contact dimension
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1998, 16 (03)
:1514-1518
[12]
Simulation of three-dimensional refractory metal step coverage over contact cuts and vias
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1996, 14 (04)
:2595-2602
[13]
SIMULATION OF PROFILE EVOLUTION IN SILICON REACTIVE ION ETCHING WITH REEMISSION AND SURFACE-DIFFUSION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1992, 10 (03)
:1091-1104
[14]
CHEMICAL SPUTTERING OF SILICON BY F+, CL+, AND BR+ IONS - REACTIVE SPOT MODEL FOR REACTIVE ION ETCHING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1986, 4 (02)
:459-467
[16]
Effects of etch products and surface oxidation on profile evolution during electron cyclotron resonance plasma etching of poly-Si
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1996, 14 (05)
:3291-3298