Dynamics of SiO desorption in reactive scattering of O-2 with a silicon surface

被引：6

作者：

Nakamura, KG

Kamioka, I

Kitajima, M

机构：

[1] National Research Institute for Metals, Tsukitba, Ibaraki 305

来源：

JOURNAL OF CHEMICAL PHYSICS | 1996年 / 104卷 / 09期

关键词：

D O I：

10.1063/1.471046

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

[No abstract available]

引用

页码：3403 / 3404

页数：2

共 10 条

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