Measurement of displacement and strain by high-resolution transmission electron microscopy

被引:5
作者
Hÿtch, MJ [1 ]
机构
[1] CNRS, Ctr Etud Chim Met, F-94407 Vitry Sur Seine, France
来源
STRESS AND STRAIN IN EPITAXY: THEORETICAL CONCEPTS, MEASUREMENTS AND APPLICATIONS | 2001年
关键词
D O I
10.1016/B978-044450865-2/50010-6
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The measurement of strain using high-resolution electron microscopy (HREM) is presented. In particular, the geometric phase technique for measuring the distortion of lattice fringes in the image is described in detail. The method is based on the calculation of the "local" Fourier components of the HREM image by filtering in Fourier space. The accuracy and inherent limitations of strain mapping will be discussed, such as image distortions, the projection problem and thin film effects. Examples are given where displacements are measured to an accuracy of 0.003 nm at nanometre resolution, strain variations to within 1%, and rotations to within 0.2degrees. Applications to the study of compositional variations in strained InxGa1-xAs islands grown on GaAs, relaxation of La0.67Sr0.33MnO3/SrTiO3 heterostructures, and misfit dislocation networks in thin epitaxially grown layers will be presented.
引用
收藏
页码:201 / 219
页数:19
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