Mercuric iodide polycrystalline films

被引:36
作者
Iwanczyk, JS [1 ]
Patt, BE [1 ]
Tull, CR [1 ]
MacDonald, LR [1 ]
Skinner, N [1 ]
Hoffman, EJ [1 ]
Fornaro, L [1 ]
Mussio, L [1 ]
Saucedo, E [1 ]
Gancharov, A [1 ]
机构
[1] Photon Imaging Inc, Northridge, CA 91324 USA
来源
PENETRATING RADIATION SYSTEMS AND APPLICATIONS III | 2001年 / 4508卷
关键词
mercuric iodide; polycrystalline; detector; x-ray; x-ray film; digital x-ra; direct x-ray; direct digital;
D O I
10.1117/12.450793
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Mercuric iodide (HgI2) polycrystalline films are being developed as a new detector technology for digital x-ray imaging. Films have been grown with areas up to 80 cm(2) (4" diameter) and thickness of 20-250 mum using sublimation. The growth techniques used can be easily extended to produce much larger film areas (>10"x10"). Thickness of the grown layers and size of the grains can be regulated over a wide range by adjusting the growth parameters. The films were characterized with respect to their electrical properties and in response to ionizing radiation. Lzakage current as low as 40 pA/cm(2) at the operating bias voltage of similar to50 V has been observed. High sensitivity and excellent linearity in the response to x-rays was measured. Signals from these HgI2 polycrystalline detectors, in response to ionizing radiation, compare favorably to the best published results for all high Z polycrystalline films grown elsewhere, including TlBr, PbI2 and HgI2. The low dark current, good sensitivity, and linearity of the response to x-rays put HgI2 polycrystalline semiconductor detectors in position as a leading candidate material for use in digital x-ray imaging systems. Our future efforts will concentrate on optimization of film growth techniques specifically for deposition on a-Si:H flat panel readout arrays.
引用
收藏
页码:28 / 40
页数:13
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