Optimizing the growth of 1.3 μm InAs/GaAs quantum dots -: art. no. 235317

被引:61
作者
Joyce, PB [1 ]
Krzyzewski, TJ
Bell, GR
Jones, TS
Le Ru, EC
Murray, R
机构
[1] Univ London Imperial Coll Sci Technol & Med, Dept Chem, Ctr Elect Mat & Devices, London SW7 2AY, England
[2] Univ London Imperial Coll Sci Technol & Med, Dept Phys, Ctr Elect Mat & Devices, London SW 2BZ, England
关键词
D O I
10.1103/PhysRevB.64.235317
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Scanning probe microscopy has been used to show that InAs/GaAs quantum dots (QD's) can be grown (at very low growth rates) using continuous InAs depositions of up to five monolayers (ML) without QD coalescence. These growth conditions result in relatively large coherent QD's which exhibit strong room temperature photoluminescence (PL) at a wavelength of 1.3 mum when capped with GaAs. The average QD volume prior to capping increases monotonically with InAs coverage up to 5 ML, but the PL emission wavelength saturates around 1.3 mum after similar to3 ML. This is due to the presence of much larger, irregular and plastically relaxed three-dimensional islands which act as sinks for additional deposited material and do not participate in optical emission.
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页数:6
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