Properties of tungsten point contacts formed with chemical vapour deposition

被引：3

作者：

Gribov, NN

Caro, J

Oosterlaken, TGM

Radelaar, S

机构：

[1] DELFT UNIV TECHNOL,DELFT INST MICROELECTR & SUBMICRON TECHNOL,2628 CJ DELFT,NETHERLANDS

[2] UKRAINIAN ACAD SCI,BI VERKIN LOW TEMP PHYS & ENGN INST,KHARKIV 310164,UKRAINE

来源：

PHYSICA B | 1996年 / 218卷 / 1-4期

关键词：

D O I：

10.1016/0921-4526(95)00569-2

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

We have used chemical vapour deposition to form tungsten point contacts. From electron microscopy we find that nanoholes in membranes are filled from the beginning of the deposition using the CVD process for alpha-W. Fabricated devices show good point-contact spectra (alpha-W) and interesting electrical characteristics (beta-W and amorphous W).

引用

页码：101 / 104

页数：4

共 16 条

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