Photooxidation of a mustard gas simulant over TiO2-SiO2 mixed-oxide photocatalyst:: Site poisoning by oxidation products and reactivation

被引:49
作者
Panayotov, D [1 ]
Kondratyuk, P [1 ]
Yates, JT [1 ]
机构
[1] Univ Pittsburgh, Ctr Surface Sci, Dept Chem, Pittsburgh, PA 15260 USA
关键词
D O I
10.1021/la0303815
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The photooxidation of 2-chloroethyl ethyl sulfide (2-CEES), a simulant for mustard gas, was studied using transmission IR spectroscopy on a mixed-oxide Tio(2)-SiO2 photocatalyst. Ultraviolet irradiation in the photon energy range from 2.1 to 5 eV was employed at a catalyst temperature of 200 K. Rapid photooxidation was observed by the loss of infrared intensity in the v(CH,) stretching region, and concomitant infrared features of adsorbed oxidation products were observed to develop. The oxidation products, captured on the photocatalyst at 200 K, were found to block 2-CEES readsorption. Upon heating the poisoned photocatalyst to about 300 K, infrared measurements indicate that the adsorbed CO2 oxidation product was desorbed. The capability for full readsorption of 2-CEES was achieved upon heating the poisoned photocatalyst to 397 K, and continued rapid photooxidation of the 2-CEES was then possible at about 1/3 the rate found for the fresh catalyst. Thus thermal treatment at 397 K of oxidation-product-poisoned TiO2-SiO2 material is able to partially restore the TiO2-SiO2 photooxidation activity.
引用
收藏
页码:3674 / 3678
页数:5
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