Van der Waals epitaxy for highly lattice-mismatched systems

被引:317
作者
Koma, A [1 ]
机构
[1] Univ Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1130033, Japan
关键词
lattice matching; Van der Waals epitaxy; molecular crystals;
D O I
10.1016/S0022-0248(98)01329-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
One of the major obstacles to realize various kinds of heterostructures is the lattice matching between constituent materials. This difficulty has been proved to be overcome if one uses the interface having van der Waals nature, This kind of interface can be formed when a layered material is grown on a cleaved face of another layered material. Moreover, it has been found that these heterostructures can be grown on a three-dimensional material substrate such as Si or GaAs, if the dangling bond on its surface is terminated by proper atoms. This idea has also been successfully applied to grow epitaxial films of organic molecular crystals such as metal phthalocyanines and fullerenes. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:236 / 241
页数:6
相关论文
共 21 条
[1]  
Aoto N, 1983, 15 C SOL STAT DEV MA, P309
[2]   Effect of growth temperature and substrate materials on epitaxial growth of coronene [J].
Cho, KA ;
Shimada, T ;
Sakurai, M ;
Koma, A .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (01) :268-274
[3]  
HARA M, 1989, JPN J APPL PHYS, V28, pL396
[4]   VANDERWAALS EPITAXY - A NEW EPITAXIAL-GROWTH METHOD FOR A HIGHLY LATTICE-MISMATCHED SYSTEM [J].
KOMA, A .
THIN SOLID FILMS, 1992, 216 (01) :72-76
[5]   FABRICATION OF ULTRATHIN HETEROSTRUCTURES WITH VANDERWAALS EPITAXY [J].
KOMA, A ;
SUNOUCHI, K ;
MIYAJIMA, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (02) :724-724
[6]  
Koma A., 1984, Microelectronic Engineering, V2, P129, DOI 10.1016/0167-9317(84)90057-1
[7]   MOLECULAR-BEAM EPITAXIAL-GROWTH OF ORGANIC THIN-FILMS [J].
KOMA, A .
PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS, 1995, 30 (2-3) :129-152
[8]   HETEROEPITAXY OF A TWO-DIMENSIONAL MATERIAL ON A 3-DIMENSIONAL MATERIAL [J].
KOMA, A ;
SAIKI, K ;
SATO, Y .
APPLIED SURFACE SCIENCE, 1989, 41-2 :451-456
[9]   HETEROEPITAXIAL GROWTH OF LAYERED SEMICONDUCTOR GASE ON A HYDROGEN-TERMINATED SI(111) SURFACE [J].
LIU, KY ;
UENO, K ;
FUJIKAWA, Y ;
SAIKI, K ;
KOMA, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1993, 32 (3B) :L434-L437
[10]   STUDIES ON AN (NH4)2SX-TREATED GAAS SURFACE USING AES, LEELS AND RHEED [J].
OIGAWA, H ;
FAN, JF ;
NANNICHI, Y ;
ANDO, K ;
SAIKI, K ;
KOMA, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (03) :L340-L342