Direct metallization of nickel on polymeric template patterns for fabrication of copper circuits on glass substrates
被引:21
作者:
Matsumura, Yasufumi
论文数: 0引用数: 0
h-index: 0
机构:
Konan Univ, Grad Sch Sci, Kobe, Hyogo 6588501, Japan
Nippon Steel Chem Co Ltd, PWB Mat Labs, Chiba 2920835, JapanKonan Univ, Fac Sci & Engn, Kobe, Hyogo 6588501, Japan
Matsumura, Yasufumi
[2
,3
]
Enomoto, Yasushi
论文数: 0引用数: 0
h-index: 0
机构:
Nippon Steel Chem Co Ltd, PWB Mat Labs, Chiba 2920835, JapanKonan Univ, Fac Sci & Engn, Kobe, Hyogo 6588501, Japan
Enomoto, Yasushi
[3
]
Sugiyama, Masanori
论文数: 0引用数: 0
h-index: 0
机构:
Konan Univ, Grad Sch Sci, Kobe, Hyogo 6588501, JapanKonan Univ, Fac Sci & Engn, Kobe, Hyogo 6588501, Japan
Sugiyama, Masanori
[2
]
Akamatsu, Kensuke
论文数: 0引用数: 0
h-index: 0
机构:
Konan Univ, Fac Sci & Engn, Kobe, Hyogo 6588501, JapanKonan Univ, Fac Sci & Engn, Kobe, Hyogo 6588501, Japan
Akamatsu, Kensuke
[1
]
Nawafune, Hidemi
论文数: 0引用数: 0
h-index: 0
机构:
Konan Univ, Fac Sci & Engn, Kobe, Hyogo 6588501, JapanKonan Univ, Fac Sci & Engn, Kobe, Hyogo 6588501, Japan
Nawafune, Hidemi
[1
]
机构:
[1] Konan Univ, Fac Sci & Engn, Kobe, Hyogo 6588501, Japan
[2] Konan Univ, Grad Sch Sci, Kobe, Hyogo 6588501, Japan
[3] Nippon Steel Chem Co Ltd, PWB Mat Labs, Chiba 2920835, Japan
We demonstrate a chemical route to depositing nickel granular layer patterns using ion-doped precursor templates, which can be used as adhesive interlayers for fabrication of copper circuit patterns on glass substrates. The poly(amic acid) templates were first dispensed from solution onto the glass surface using a fine-precision dispenser, followed by Ni(2+) ion doping through selective ion exchange reaction. The reduction treatment using aqueous NaBH(4) solution allowed the formation of a nickel granular layer on the poly(amic acid) surface, which could catalyze subsequent electrodeposition of copper. The resulting copper/nickel/polyimide-layered structure showed good adhesion with the glass substrate. This work can benefit the understanding of the growth process of metallic thin films via the direct metallization process and provide important experimental data for developing novel fabrication processes for copper circuit patterns on glass substrates.