Maskless lithography

被引：155

作者：

Menon, Rajesh

Patel, Amil

Gil, Dario

Smith, Henry I. ^{[1
]}

机构：

[1] MIT, Elect Res Lab, Cambridge, MA 02139 USA

来源：

MATERIALS TODAY | 2005年 / 8卷 / 02期

关键词：

D O I：

10.1016/S1369-7021(05)00699-1

中图分类号：

T [工业技术];

学科分类号：

08 [工学];

摘要：

The increasingly important role of maskless lithography in industry, research, and emerging applications in nanoscale science and engineering is discussed. The various forms of maskless lithography are reviewed with major emphasis on zone-plate-array lithography, a new paradigm that promises low cost and extendibility to the limits of the lithographic process.

引用

收藏

页码：26 / 33

页数：8

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