Nitrogen effects on crystallization kinetics of amorphous TiOxNy thin films

被引:34
作者
Hukari, K [1 ]
Dannenberg, R
Stach, EA
机构
[1] AFG Dev Ctr, Petaluma, CA 94954 USA
[2] Lawrence Berkeley Lab, Div Mat Sci, Natl Ctr Electron Microscopy, Berkeley, CA 94720 USA
关键词
D O I
10.1557/JMR.2002.0077
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The crystallization behavior of amorphous TiOxNy (x much greater than y) thin films was investigated by in situ transmission electron microscopy. The Johnson-Mehl-Avrami-Kozolog (JMAK) theory was used to determine the Avrami exponent, activation energy, and the phase velocity pre-exponent. Addition of nitrogen inhibited diffusion, increasing the nucleation temperature, while decreasing the growth activation energy, Kinetic variables extracted from individual crystallites were compared to JMAK analysis of the fraction transformed, and a change of 6% in the activation energy led to agreement between the methods. From diffraction patterns and index of refraction the crystallized phase was found to be predominantly anatase.
引用
收藏
页码:550 / 555
页数:6
相关论文
共 20 条
[1]   Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition [J].
Aarik, J ;
Aidla, A ;
Kiisler, AA ;
Uustare, T ;
Sammelselg, V .
THIN SOLID FILMS, 1997, 305 (1-2) :270-273
[2]   Structural and optical properties of sputtered Titania films [J].
Amor, SB ;
Baud, G ;
Besse, JP ;
Jacquet, M .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1997, 47 (02) :110-118
[3]   Kinetics of phase change I - General theory [J].
Avrami, M .
JOURNAL OF CHEMICAL PHYSICS, 1939, 7 (12) :1103-1112
[4]   Study of TiOxNy thin film selective surfaces produced by ion assisted deposition [J].
Bittar, A ;
Cochrane, D ;
Caughley, S ;
Vickeridge, I .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1997, 15 (02) :223-229
[5]   Reactive sputter deposition of titanium dioxide [J].
Dannenberg, R ;
Greene, P .
THIN SOLID FILMS, 2000, 360 (1-2) :122-127
[6]  
DANNENBERG R, 1999, 5 INT S SPUTT PLASM, P116
[7]  
DANNENBERG R, 1999, SVC 42 ANN TECHN C P, P23
[8]   N+ ion implantation effects on microhardness and adhesion in TiO2 films [J].
Fukushima, K ;
Yamada, I .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 112 (1-4) :116-119
[9]   REFINEMENT OF STRUCTURE OF ANATASE AT SEVERAL TEMPERATURES [J].
HORN, M ;
SCHWERDTFEGER, CF ;
MEAGHER, EP .
ZEITSCHRIFT FUR KRISTALLOGRAPHIE, 1972, 136 (3-4) :273-281
[10]   STRESS-RELAXATION IN REACTIVELY SPUTTER-DEPOSITED TIOXNY FILMS [J].
JIN, P ;
MARUNO, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (9A) :2058-2062