Gold oxide as precursor to gold silica nanocomposites

被引:37
作者
Maya, L
Paranthaman, M
Thundat, T
Bauer, ML
机构
[1] OAK RIDGE NATL LAB,HLTH SCI RES DIV,OAK RIDGE,TN 37831
[2] TRI INC,KNOXVILLE,TN 37931
[3] OAK RIDGE NATL LAB,DIV INSTRUMENTAT & CONTROLS,OAK RIDGE,TN 37831
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 01期
关键词
D O I
10.1116/1.589020
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Gold oxide films were prepared by reactive sputtering of pure gold in an oxygen plasma. These films were characterized by chemical and physical means to better understand the behavior of this metastable compound. Gold oxide, Au2O3, decomposes into the elements at 350 degrees C. It does not react with dry carbon dioxide but does form a metastable bicarbonate in the presence of moisture and CO2, releasing oxygen and eventually reverting to elemental gold. Gold oxide was generated by reactive sputtering along with silica in an oxygen plasma from Au-Si solidified alloys. Gold oxide decomposed upon pyrolysis to produce composites showing different characteristics depending on the gold content. Composites containing about 95 wt% gold produced reflective, conductive, and adherent films. Composites derived from an alloy containing 5 at. % gold produced a nanostructured material with gold clusters of about 5 nm in diameter dispersed in a silica matrix. This nanocomposite showed high resistivity, and capacitance with a dielectric constant of 400. (C) 1996 American Vacuum Society.
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页码:15 / 21
页数:7
相关论文
共 23 条
[1]   VOLTAMMETRIC CHARACTERIZATION OF GOLD, METALLIZED-PLASTIC ELECTRODES, FOLLOWING EXPOSURE TO ION-BEAMS OR RF PLASMAS [J].
ARMSTRONG, NR ;
WHITE, JR .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1982, 131 (JAN) :121-136
[2]   NEAR-SURFACE NUCLEATION AND CRYSTALLIZATION OF AN ION-IMPLANTED LITHIA-ALUMINA-SILICA GLASS [J].
ARNOLD, GW .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (10) :4466-4473
[3]   OPEN-CIRCUIT REDUCTION OF OXYGEN COVERAGE ON AU BY ALLYL ALCOHOL IN AQUEOUS-ELECTROLYTES [J].
CELDRAN, R ;
GONZALEZVELASCO, J .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (10) :2373-2379
[4]   X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES OF OXIDE-FILMS ON PLATINUM AND GOLD ELECTRODES [J].
DICKINSON, T ;
POVEY, AF ;
SHERWOOD, PMA .
JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I, 1975, 71 (02) :298-311
[5]   PREPARATION OF GOLD-FILMS BY PLASMA-CVD [J].
FEURER, E ;
SUHR, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1987, 44 (02) :171-175
[6]   AU+-ION-IMPLANTED SILICA GLASS WITH NONLINEAR OPTICAL PROPERTY [J].
FUKUMI, K ;
CHAYAHARA, A ;
KADONO, K ;
SAKAGUCHI, T ;
HORINO, Y ;
MIYA, M ;
HAYAKAWA, J ;
SATOU, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1991, 30 (4B) :L742-L744
[7]   DETERMINATION OF AU-O BOND-ENERGY BY GLOW-DISCHARGE MASS-SPECTROMETRY [J].
HECQ, A ;
VANDY, M ;
HECQ, M .
JOURNAL OF CHEMICAL PHYSICS, 1980, 72 (04) :2876-2878
[8]   SOME EXPERIMENTAL ASPECTS OF DC REACTIVE SPUTTERING [J].
HECQ, M ;
HECQ, A ;
LIEMANS, M .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (12) :6176-6178
[9]   FORMATION OF NANOMETER-SIZED AU DOTS ON SI SUBSTRATE IN AIR [J].
HOSAKA, S ;
KOYANAGI, H ;
KIKUKAWA, A ;
MARUYAMA, Y ;
IMURA, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (03) :1872-1878
[10]   LASER WRITING OF HIGH-PURITY GOLD LINES [J].
JUBBER, M ;
WILSON, JIB ;
DAVIDSON, JL ;
FERNIE, PA ;
JOHN, P .
APPLIED PHYSICS LETTERS, 1989, 55 (14) :1477-1479