The atomic structure of the Si(111) (2 root 3x2 root 3)R30 degrees-Sn reconstruction

被引：19

作者：

Levermann, AH

Howes, PB

Edwards, KA

Anyele, HT

Matthai, CC

Macdonald, JE

Feidenhansl, R

Lottermoser, L

Seehofer, L

Falkenberg, G

Johnson, RL

机构：

[1] UNIV WALES COLL CARDIFF,DEPT PHYS,CARDIFF CF2 3YB,S GLAM,WALES

[2] RISO NATL LAB,DK-4000 ROSKILDE,DENMARK

[3] UNIV HAMBURG,INST EXPT PHYS 2,D-22761 HAMBURG,GERMANY

来源：

APPLIED SURFACE SCIENCE | 1996年 / 104卷

关键词：

D O I：

10.1016/S0169-4332(96)00132-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have studied the atomic structure of the (2 root 3x2 root)R30 degrees reconstruction induced by adsorption of about 1.1 monolayers of Sn on Si(lll) using surface X-ray diffraction (SXRD) and scanning tunnelling microscopy (STM). The experimentally obtained structure factors in SXRD are in contradiction with existing models in the literature and we conclude the need for a new surface atomic structure model. We have been able to determine a number of properties of an appropriate surface model to allow a better fit to the experimental structure factors.

引用

页码：124 / 129

页数：6

共 12 条

[1] THE STRUCTURE OF THE SI(111)(SQUARE-ROOT3XSQUARE-ROOT3)R30-DEGREES-SN SURFACE DETERMINED USING X-RAY-DIFFRACTION [J].