EFFECT OF SURFACE RECONSTRUCTION ON FERMI-LEVEL PINNING IN THE SN ON SI(111) SYSTEM

被引:14
作者
GRIFFITHS, CL
ANYELE, HT
MATTHAI, CC
CAFOLLA, AA
WILLIAMS, RH
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 04期
关键词
D O I
10.1116/1.586969
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have performed detailed photoemission studies on the Si(111)(square-root 3 x square-root 3)R30-degrees-Sn and Si(111)(2 square-root 3 X 2 square-root 3)R30-degrees-Sn reconstructed surfaces. Band bending is observed in both cases resulting in n-type Schottky barrier heights of (0.66 +/- 0.09) and (0.99 +/- 0.10) eV, respectively. In parallel, theoretical calculations using the self-consistent tight binding method in the extended Huckel approximation have been performed to determine the electronic structure and barrier heights at these reconstructed surfaces. The difference in barrier heights is found to be in excellent agreement with experiment.
引用
收藏
页码:1559 / 1563
页数:5
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