The subimplantation model for diamond-like carbon films deposited by methane gas decomposition

In this work, the formation of hard a-C:H films deposited on the cathode of an r.f. sputtering system through the decomposition of methane gas was explained using the subimplantation model. Even though in a r.f. plasma deposition the ions striking the films surface are not monoenergetic, the stress data match the theoretical model proposed by C.A. Davis. The stress versus bias plot shows a behavior similar to those already obtained for ta-C and ta-C:H films, which are prepared using monoenergetic ion beam. (C) 1999 Elsevier Science S.A. All rights reserved.