Influence of Impinging Ion Energy on the Bonding and Mechanical Characteristics of DLC Films Deposited by Microwave ECR Plasma CVD

被引：15

作者：

Singh, Sujit ^{[1
]}

Pandey, Mukesh ^{[2
]}

Kishore, Ramaswamy ^{[3
]}

Chand, Naresh ^{[1
]}

Dash, Sitaram ^{[4
]}

Tyagi, Ashok ^{[4
]}

Patil, Dinkar ^{[1
]}

机构：

[1] Bhabha Atom Res Ctr, Div Laser & Plasma Technol, Bombay 400085, Maharashtra, India

[2] Bhabha Atom Res Ctr, High Pressure Phys Div, Bombay 400085, Maharashtra, India

[3] Bhabha Atom Res Ctr, Div Mat Sci, Bombay 400085, Maharashtra, India

[4] Indira Gandhi Ctr Atom Res, Div Mat Sci, Kalpakkam 603102, Tamil Nadu, India

来源：

PLASMA PROCESSES AND POLYMERS | 2008年 / 5卷 / 09期

关键词：

diamond-like carbon (DLC); electron cyclotron resonance (ECR) plasmas; hardness; Raman spectroscopy;

D O I：

10.1002/ppap.200800011

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

DLC films were deposited on Si(111) substrates using CH4/Ar gas and microwave ECR plasma CVD processes. The energy of the ions impinging on the substrate during deposition was varied by changing the rf self bias voltage developed on the substrate. The bonding characteristics of the deposited films were investigated using FTIR and Raman spectroscopy, and mechanical properties were measured by nanoindentation and nanoscratch tests. The results obtained from different characterization techniques are correlated and explained on the basis of existing growth models for DLC films. Our studies indicate that the energy of the ions impinging on the substrates has a strong influence on the bonding characteristics and mechanical properties of the films.

引用

页码：853 / 860

页数：8

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