High-temperature microwave characteristics of GaAs MESFET devices with AlAs buffer layers

被引:9
作者
Ito, C [1 ]
Jenkins, T [1 ]
Trombley, G [1 ]
Lee, R [1 ]
Reston, R [1 ]
Havasy, C [1 ]
Johnson, B [1 ]
Eppers, C [1 ]
机构
[1] USAF,WRIGHT LAB,SOLID STATE ELECTR DIRECTORATE,WRIGHT PATTERSON AFB,OH 45433
关键词
D O I
10.1109/55.475563
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
AlAs buffers used to reduce the leakage current of high-temperature GaAs MESFET devices are shown to have no detrimental effect on the microwave performance measured to 200 degrees C. The f(t) values decrease with increasing temperature, but do not appear to be influenced by the AlAs buffer. The f(max) values also decrease with increasing temperature; however, they are improved with increasing AlAs buffer thickness due to a concomitant decrease in the device output conductance. At 200 degrees C ambient temperature, f(t) and f(max) values of 14.5 GHz and 36.7 GHz, respectively, were measured.
引用
收藏
页码:16 / 18
页数:3
相关论文
共 17 条
[1]   SHORT-CHANNEL EFFECTS AND DRAIN-INDUCED BARRIER LOWERING IN NANOMETER-SCALE GAAS-MESFETS [J].
ADAMS, JA ;
THAYNE, IG ;
WILKINSON, CDW ;
BEAUMONT, SP ;
JOHNSON, NP ;
KEAN, AH ;
STANLEY, CR .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (06) :1047-1052
[2]  
ANHOLT R, 1993, MICROWAVES RF SEP, P91
[3]   EXPERIMENTAL INVESTIGATION OF THE TEMPERATURE-DEPENDENCE OF GAAS-FET EQUIVALENT-CIRCUITS [J].
ANHOLT, RE ;
SWIRHUN, SE .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (09) :2029-2036
[4]   AL AND GA DIFFUSION-BARRIERS IN MOLECULAR-BEAM EPITAXY [J].
DABIRAN, AM ;
NAIR, SK ;
HE, HD ;
CHEN, KM ;
COHEN, PI .
SURFACE SCIENCE, 1993, 298 (2-3) :384-391
[5]   THIN-FILM DEPOSITION AND MICROELECTRONIC AND OPTOELECTRONIC DEVICE FABRICATION AND CHARACTERIZATION IN MONOCRYSTALLINE ALPHA AND BETA SILICON-CARBIDE [J].
DAVIS, RF ;
KELNER, G ;
SHUR, M ;
PALMOUR, JW ;
EDMOND, JA .
PROCEEDINGS OF THE IEEE, 1991, 79 (05) :677-701
[6]   A DETAILED INVESTIGATION OF THE D-X CENTER AND OTHER TRAP LEVELS IN GAAS-ALXGA1-XAS MODULATION-DOPED HETEROSTRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY [J].
DHAR, S ;
HONG, WP ;
BHATTACHARYA, PK ;
NASHIMOTO, Y ;
JUANG, FY .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (05) :698-706
[7]   SUBSTRATE CURRENT IN GAAS-MESFETS [J].
EASTMAN, LF ;
SHUR, MS .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (09) :1359-1361
[8]  
FENG MS, COMMUNICATION
[9]   COMPARATIVE BEHAVIOR AND PERFORMANCES OF MESFET AND HEMT AS A FUNCTION OF TEMPERATURE [J].
GOBERT, Y ;
SALMER, G .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (03) :299-305
[10]  
HALLAIS J, 1978, P GAAS RELATED COMPS, V45, P361