Front- and backside investigations of thermal and electronic properties of semiconducting devices

被引:8
作者
Fiege, GBM [1 ]
Schade, W
Palaniappan, M
Ng, V
Phang, JCH
Balk, LJ
机构
[1] Berg Univ Wuppertal, Lehrstuhl Elekt, D-42097 Wuppertal, Germany
[2] Natl Univ Singapore, Ctr IC Failure Anal & Reliabil, Singapore 117548, Singapore
关键词
D O I
10.1016/S0026-2714(99)00126-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Shrinking feature sizes of electronic devices are leading to an increase of the internal electrical fields resulting in an increased hot electron generation. Consequently, the investigation of the resulting electrical device degradation and breakdown mechanisms gain in significance. A powerful tool for these investigations is the photon emission microscope (PEM). A disadvantage of this technique, however, is the inability to image radiative recombination processes which are taking place underneath metallization layers. In this paper, we will show that PEM investigations from the backside overcome problems of failure localization caused by opaque metal contacts. A further scope of this work is to compare the information which is obtained by collecting the emitted light with thermal properties like failure induced hot spots inside a device. This thermal characterization is carried out with a scanning thermal microscope (SThM), which is used for the localization of failures in integrated 3 devices and for backside measurements on thinned substrates. (C) 1999 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:937 / 940
页数:4
相关论文
共 6 条
[1]  
[Anonymous], P 22 INT S TEST FAIL
[2]   Thermal analyses by means of scanning probe microscopy [J].
Balk, LJ ;
Cramer, RM ;
Fiege, GBM .
PROCEEDINGS OF THE 1997 6TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS, 1997, :1-6
[3]   Failure analysis of integrated devices by Scanning Thermal Microscopy (SThM) [J].
Fiege, GBM ;
Feige, V ;
Phang, JCH ;
Maywald, M ;
Gorlich, S ;
Balk, LJ .
MICROELECTRONICS RELIABILITY, 1998, 38 (6-8) :957-961
[4]   QUANTITATIVE EMISSION MICROSCOPY [J].
KOLZER, J ;
BOIT, C ;
DALLMANN, A ;
DEBOY, G ;
OTTO, J ;
WEINMANN, D .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (11) :R23-R41
[5]  
Rasras M, 1998, MICROELECTRON RELIAB, V38, P877, DOI 10.1016/S0026-2714(98)00106-1
[6]  
TAO JM, 1995, P 5 IPFA, P60